Quintel Mask Aligner PDF c4351591
MarvellNanofabricationLaboratoryUniversityofCaliforniaBerkeleyBerkeleyMicrofabricationLaboratoryaeLabManualHEMarvellNanoLabMemberloginLabManualContentsMercuryWebBerkeleyMicrolab1020304050Chapter416QuintelMaskAlignerquintel382TitleQuintelQ4000MaskAlignerPurposeTheQuintelQ4000MAMaskAlignerisatopandbottomsidecontactlithographyprinterwiththevideoviewsplitfieldmicroscopeusedforfinelinelithographydownto1micronorbetterItiscapableofprocessingboth4and6inchsubstratesusing7photomasksThequintelwasrecentlymodifiedtoaccept6waferswhileretainingtheabilityfor4wafersandsmallersubstratesThismodificationduplicatesmanyofthecontactandproximityphotolithographycapabilitiesoftheksalignerallowingNanoLabmemberaccesstotwocontactprintersandprovidesabackupwhenonealignerisdownformaintenanceorrepairsModificationsincludedanew6chuckandanewmaskplatewhilekeepingthe4chuckThenewmaskplaterequiresa7maskwhichmatchestheksalignersmaskrequirementsThequintelretainsitsIRlightsourceandcamerasforthroughwaferbacksidealignmentfor6wafersThepreviouslyusedmaskclamphasbeenobviatedbythismodificationandisnolongeravailableorneededAfterreadingthismanualtheusershouldbeabletodescribeatypicalMAquintelprocessforbothtopandbacksidealignmentexplainthetheoryofoperationandstateallhazardsassociatedwiththesystemAftersuccessfullycompletingthequalificationproceduresforthistoolseeAppendix122theusershouldbeabletoperformafullphotolithographyprocessforbothTSAandBSAusingthissystemOnlytrainedandapprovedqualifiedUsersmayusethistoolScopeThemaskalignerconsistsofseveralcoordinatedinterrelatedsystemsincluding31Substrateloadingholdingandunloadingsystem32Themasksupportingsystem33Thesubstratemaskscanalignlocksystem34Theviewingsystemmicroscopeandilluminators35Theexposingsystem36Use7inchmasksApplicableDocumentsRevisionHistoryQuintelQ4000OperatingManualManufacturerhardcopyislocatedintheMicrolabofficeDefinitionsampProcessTerminologyAllthefrontpanelcontrolsarepushonpushoffbuttonswithindicatorlampsThebuttonsareilluminatedgreenwhenanoptionisactive51MASKVACUUMTurnsvacuumonofftoaffixmasktomaskchuck52LOADCLEARRaisesthewaferchuck53CLEARLowersthewaferchuckquintelChapter41654SEPCONTACTWhenawaferisloadedthechuckwillplanarizewiththemaskandthenloweroutofcontactforalignmentContactisselectedtoputthewaferbackintocontactwiththemaskafteralignmentandbeforeexposingLightsilluminatetoindicatewhichmodeisact
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